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Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine "runs," thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry's widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.
James Moyne, Enrique del Castillo, Arnon M. Hurwitz
| Author | James Moyne (Editor), Enrique del Castillo (Editor), Arnon M. Hurwitz (Editor) |
| ISBN-13 | 9781351836128 |
| Publisher | CRC Press |
| Publication Date | 10/08/2018 |
| Page Count | 368 pages |
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